Digital Direct Exposure

Maskless, Beam – overlapping method. Applicable to next generation PWB processes

Hitachi original high – speed RIP (SRC) and light source provide long – lasting uniform light intensity and are capable of high – precision exposure

Maskless, Beam – overlapping method. Applicable to next generation PWB processes

Hitachi original high – speed RIP (SRC) and light source provide long – lasting uniform light intensity and are capable of high – precision exposure

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Technical Data

Maximum film size: 400 mm x 320 mm
Maximum plotting area: 380 x 300 mm
Resolution X: 8 selections from 508 to 8192 dpi
Resolution Y: 8000 dpi
Plotting speed: 10 mm of film width / minute for 1016 dpi
Source of light: Laser diode 670 nm (red)
Data input: Gerber (RS 274D, RS 274 X), high resolution BMP
Photoplotter software, included on CD:
Gerber viewer; Automatic aperture converter for all known Electronic CAD layout systems
D-code editing, output preview & print
Interactive, absolute or relative image positioning, film and drill penalization
Negative plotting, image mirroring
Control software for Windows 98 … XP included, USB connection required
Unit dimensions (LxWxH): 700x350x200 mm