Maskless, Beam – overlapping method. Applicable to next generation PWB processes
Hitachi original high – speed RIP (SRC) and light source provide long – lasting uniform light intensity and are capable of high – precision exposure
Maskless, Beam – overlapping method. Applicable to next generation PWB processes
Hitachi original high – speed RIP (SRC) and light source provide long – lasting uniform light intensity and are capable of high – precision exposure
Maskless, Beam – overlapping method. Applicable to next generation PWB processes
Hitachi original high – speed RIP (SRC) and light source provide long – lasting uniform light intensity and are capable of high – precision exposure
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Manufacturer: Hakuto Co. Ltd., Japan Automatic Exposure System(Model : HAP5020)
COMPACT MULTI LAYER SHEAR/BEVELER WITH OPTICAL ALIGNMENT SYSTEM.
Technical Data
High precision vacuum exposure unit especially designed for double sided contact exposure of presensitized base materials such as tampon printing clichés, PCBs, front-panels, daylight films and other UV sensitive coatings.
Manufacturer: Hitachi, Japan PWB Hole Analyzer / PWB Hole Tester Machine
Manufacturer: First EIE, Switzerland Photo Plotter
Manufacturer: Hakuto Co. Ltd., JapanLaminator

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